Journal of Systems Engineering and Electronics ›› 2010, Vol. 32 ›› Issue (5): 1051-1054.doi: 10.3969/j.issn.1001-506X.2010.05.037

• 软件、算法与仿真 • 上一篇    下一篇

基于Gabor相位和局部二值模式的AAM纹理表示

苏亚, 高新波, 王博, 王宇   

  1. (西安电子科技大学电子工程学院, 陕西 西安 710071)
  • 出版日期:2010-05-24 发布日期:2010-01-03

Gabor phase and LBP based texture representation in AAM

SU Ya, GAO Xin-bo, WANG Bo, WANG Yu   

  1. (School of Electronic Engineering, Xidian Univ., Xi’an 710071, China)
  • Online:2010-05-24 Published:2010-01-03

摘要:

提出一种基于Gabor相位与局部二值模式(local binary patterns, LBP)算子的活动表观模型(active appearance model, AAM)。与基于亮度的AAM相比,改进模型在三个方面提高了算法性能:提供多尺度多方向的Gabor纹理,提高了模型的匹配精度;增强了对外部环境变化(如光照)的鲁棒性;基于LBP的纹理编码去除了大量冗余。实验结果表明该模型能够有效提高模型的匹配精度。

Abstract:

An active appearance model(AAM) based on Gabor phase and local binary patterns(LBP) is presented. In comparison with the intensity based AAM, the proposed model improves the performance in three aspects: providing multi-scale and multi-direction Gabor texture which enhances the fitting accuracy of the model; improving the robustness to environmental changes, e.g., illumination; LBP based texture coding reduces a large amount of the redundency. Experimental results on various datasets demonstrate that the proposed model can effectively improve the fitting accuracy.