基于混合本征模匹配的光刻掩膜分析方法研究

doi:10.12305/j.issn.1001-506X.2023.11.02

Abstract

Abstract:

Implicit mode matching is a popular analyzing method for waveguide structures in computational electromagnetic. This paper discusses the limitation of conventional implicit mode matching method for solving computational lithography problems. Based on the existing implicit mode matching method, a hybrid eigenmode restoration algorithm based on Krylov subspace theory and a explicit mode matching method are proposed. The eigenmode accuracy loss caused by Lanczos method and other problems are solved while preserving the O(N^1.5) complexity. Benchmark cases for representative waveguide and periodic structures verify the restored eigenmode accuracy and efficiency characters of the proposed method. A simulation case for highly complicated lithography mask structure is presented, and results compared with high frequency structure simulator (HFSS) software and rigorous coupled wave analysis (RCWA) method indicate the application significance of the proposed method in solving highly complicated computational lithography problems.

Key words: computational electromagnetics, mode matching, computational lithography

CLC Number:

O436.1

Jia LIU, Min SU, Qunyu XU. Research on hybrid eigenmode restoration and mode matching algorithm for computational lithography problems[J]. Systems Engineering and Electronics, 2023, 45(11): 3374-3381.

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References 30

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数值算法及参数	TE极化		TM极化
迭代步数	200	300	200	300
隐式模式匹配	0.07	0.04	0.08	0.03
显式模式匹配	0.03	0.009	0.05	0.008

数值算法	传输系数	相位
RCWA	0.042	0.033
隐式模式匹配	0.056	0.029
显式模式匹配	0.040	0.031

数值算法	193 nm	217 nm
RCWA/s	0.042	0.033
隐式模式匹配/s	0.056	0.029
显式模式匹配/s	0.040	0.031

数值算法	193 nm	217 nm
RCWA/MB	1 424	1 233
隐式模式匹配/MB	470	411
显式模式匹配/MB	859	792

Research on hybrid eigenmode restoration and mode matching algorithm for computational lithography problems

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